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Erratum: “Suppressed diffusion of boron and carbon in carbon-rich silicon” [Appl. Phys. Lett. 73, 1682 (1998)]
Author(s) -
H. Rücker,
B. Heinemann,
Wilfried Röpke,
R. Kurps,
D. Krüger,
G. Lippert,
H. J. Osten
Publication year - 1999
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.124301
Subject(s) - boron , silicon , carbon fibers , diffusion , materials science , chemical physics , atomic physics , chemistry , nanotechnology , thermodynamics , physics , optoelectronics , organic chemistry , composite material , composite number

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