A study of electron field emission as a function of film thickness from amorphous carbon films | Zendy

R. D. Forrest | Zendy; A.P. Burden | Zendy; S. Ravi P. Silva | Zendy; L.K. Cheah | Zendy; Xiaohong Shi | Zendy

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A study of electron field emission as a function of film thickness from amorphous carbon films

Author(s) -

R. D. Forrest,

A.P. Burden,

S. Ravi P. Silva,

L.K. Cheah,

Xiaohong Shi

Publication year - 1998

Publication title -

applied physics letters

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.182

H-Index - 442

eISSN - 1077-3118

pISSN - 0003-6951

DOI - 10.1063/1.122894

Subject(s) - field electron emission , amorphous carbon , materials science , amorphous solid , carbon film , electron , electric field , thin film , carbon fibers , field (mathematics) , condensed matter physics , nanotechnology , composite material , chemistry , physics , crystallography , quantum mechanics , composite number , mathematics , pure mathematics

The electron field-emission properties of hydrogenated amorphous carbon and nitrogenated tetrahedral amorphous carbon thin films are examined by measuring the field-emission current as a function of the applied macroscopic electric field. The experimental results indicate the existence of an optimum film thickness for low-threshold electron field emission. The predictions of various emission models are compared to the experimental results.

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