Single-electron effects in heavily doped polycrystalline silicon nanowires
Author(s) -
A. C. Irvine,
Z. A. K. Durrani,
H. Ahmed,
S. Biesemans
Publication year - 1998
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.122101
Subject(s) - polycrystalline silicon , materials science , nanowire , silicon , grain boundary , condensed matter physics , electron beam lithography , coulomb blockade , doping , crystallite , oscillation (cell signaling) , optoelectronics , nanotechnology , chemistry , resist , electrical engineering , composite material , physics , metallurgy , microstructure , voltage , transistor , biochemistry , engineering , layer (electronics) , thin film transistor
08/05/14 meb. Publisher version, Ok to add
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom