Hydrogen desorption in SiGe films: A diffusion limited process | Zendy

J. Vizoso | Zendy; Ferran Martı́n | Zendy; J. Suñé | Zendy; M. Nafrı́a | Zendy

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Hydrogen desorption in SiGe films: A diffusion limited process

Author(s) -

J. Vizoso,

Ferran Martı́n,

J. Suñé,

M. Nafrı́a

Publication year - 1997

Publication title -

applied physics letters

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.182

H-Index - 442

eISSN - 1077-3118

pISSN - 0003-6951

DOI - 10.1063/1.118429

Subject(s) - desorption , hydrogen , diffusion , materials science , surface diffusion , soft laser desorption , kinetics , thermal desorption spectroscopy , diffusion process , chemical physics , analytical chemistry (journal) , thermodynamics , chemistry , adsorption , physics , knowledge management , innovation diffusion , organic chemistry , quantum mechanics , chromatography , computer science , matrix assisted laser desorption/ionization

A model to explain the hydrogen desorption kinetics in SiGe alloys is presented. This is an extension of a previous desorption model of hydrogen from Si, that considers the presence of three dimer types in the surface in which hydrogen atoms tend to pair before the desorptionreaction.Surfacediffusion is included in the model. The comparison with experimental results shows that desorption is a diffusion limited process

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