Copper nitride and tin nitride thin films for write-once optical recording media | Zendy

Toshiro Maruyama | Zendy; Tomonori Morishita | Zendy

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Copper nitride and tin nitride thin films for write-once optical recording media

Author(s) -

Toshiro Maruyama,

Tomonori Morishita

Publication year - 1996

Publication title -

applied physics letters

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.182

H-Index - 442

eISSN - 1077-3118

pISSN - 0003-6951

DOI - 10.1063/1.117978

Subject(s) - nitride , tin , materials science , thin film , sputtering , copper , thermal decomposition , reflectivity , optoelectronics , optical recording , titanium nitride , layer (electronics) , optics , metallurgy , composite material , nanotechnology , chemistry , physics , organic chemistry

The feasibility of using copper nitride and tin nitride thin films as write‐once optical recording media was explored. The Cu3N and SnNx films were obtained by the reactive sputtering method. They were thermally decomposed into Cu and Sn films at 470 and 550 °C, respectively. The Cu film obtained by the thermal decomposition showed a large difference in reflectance which is applicable to the optical recording media. The Sn film obtained by the thermal decomposition included SnO, and consequently it showed a small difference in reflectance from that of SnNx film.

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