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Nanostructuring on WSe2 with the atomic force microscope by a potential controlled electrochemical reaction
Author(s) -
M. Böhmisch,
Frank Burmeister,
Johannes Boneberg,
P. Leǐderer
Publication year - 1996
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.117465
Subject(s) - electrochemistry , monolayer , etching (microfabrication) , materials science , nanostructure , fabrication , nanotechnology , characterization (materials science) , microscope , atomic force microscopy , nanometre , nanolithography , chemical engineering , analytical chemistry (journal) , optoelectronics , electrode , chemistry , optics , composite material , layer (electronics) , medicine , alternative medicine , physics , engineering , pathology , chromatography
We present a method for the controlled fabrication of stable nanostructures under ambient conditions. The surfaces under consideration, WSe2, are imaged by an atomic force microscope. By applying a voltage between the tip and the sample, we can control an etching process at the surface: different voltage thresholds for the creation and the growth of structures of one monolayer (Se–W–Se) depth are observed. Our measurements on p‐doped WSe2 strongly support an electrochemical corrosion reaction in a physisorbed water film. This method allows the in situ preparation and characterization of individual nanometer‐sized structures on WSe2 and other metal dichalcogenides.

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