Nitrogen containing hydrogenated amorphous carbon for thin-film field emission cathodes | Zendy

G.A.J. Amaratunga | Zendy; S. Ravi P. Silva | Zendy

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Nitrogen containing hydrogenated amorphous carbon for thin-film field emission cathodes

Author(s) -

G.A.J. Amaratunga,

S. Ravi P. Silva

Publication year - 1996

Publication title -

applied physics letters

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.182

H-Index - 442

eISSN - 1077-3118

pISSN - 0003-6951

DOI - 10.1063/1.116173

Subject(s) - field electron emission , anode , cathode , materials science , current density , amorphous carbon , carbon fibers , amorphous solid , analytical chemistry (journal) , nitrogen , electric field , electrode , electron , chemistry , composite material , crystallography , physics , organic chemistry , quantum mechanics , chromatography , composite number

Field emission measurements using 0.3 μm thick nitrogen containing hydrogenated amorphous carbon films (a‐C:H:N) on n++‐Si cathodes are reported. Onset emission fields as low as 4 V μm−1 have been obtained using a flat plate anode configuration. Uniform emission is observed over the entire cathode area at current densities below 7×10−2 mA cm−2. At higher current density preferential emission from spots is observed. The spot emission is imaged using the ITO coated plate anode. A model based on the a‐C:H:N acting as a space charge interlayer on the n++‐Si is proposed to explain the emission at low electric fields.

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