Open AccessThe multiply charged ion production in ECR ion sources
Author(s) -
G. Shirkov
Publication year - 1992
Publication title -
review of scientific instruments
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.605
H-Index - 165
eISSN - 1089-7623
pISSN - 0034-6748
DOI - 10.1063/1.1142790
Subject(s) - ion , atomic physics , plasma , ion beam , ion beam deposition , ion gun , ion source , highly charged ion , materials science , charged particle , pulse (music) , physics , voltage , nuclear physics , quantum mechanics
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