Open AccessEmittance characteristics of negative ion beams generated by the sputter technique
Author(s) -
G. D. Alton
Publication year - 1990
Publication title -
review of scientific instruments
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.605
H-Index - 165
eISSN - 1089-7623
pISSN - 0034-6748
DOI - 10.1063/1.1141236
Subject(s) - thermal emittance , caesium , sputtering , ion , atomic physics , materials science , beam emittance , ion beam , beam (structure) , momentum (technical analysis) , ion source , optics , physics , nuclear physics , thin film , nanotechnology , finance , quantum mechanics , economics
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