Atomic oxygen detection by a silver-coated quartz deposition monitor | Zendy

V. Matijašević | Zendy; E. L. Garwin | Zendy; R. H. Hammond | Zendy

AI Assistant Blog Pricing

Home ZAIA Blog

Open Access

Atomic oxygen detection by a silver-coated quartz deposition monitor

Author(s) -

V. Matijašević,

E. L. Garwin,

R. H. Hammond

Publication year - 1990

Publication title -

review of scientific instruments

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.605

H-Index - 165

eISSN - 1089-7623

pISSN - 0034-6748

DOI - 10.1063/1.1141145

Subject(s) - flux (metallurgy) , materials science , oxygen , quartz , deposition (geology) , atomic oxygen , analytical chemistry (journal) , detection limit , hydrogen , atomic layer deposition , thin film , nanotechnology , chemistry , metallurgy , paleontology , organic chemistry , chromatography , sediment , biology

A method for measuring the flux of atomic oxygen utilizing a silver film on a quartz‐crystal deposition rate monitor is described. Measuring the initial oxidation rate of the silver, which is proportional to the atomic oxygen flux, determines a lower limit on the atomic oxygen flux. This method is more direct than measuring the conductance of the silver film, has an intrinsic flux detection range of 1013–1017 atoms/cm2 s, and is reversible by exposing the sensor to an atomic hydrogen flux.

The content you want is available to Zendy users.

Already have an account? Click here to sign in.

Having issues? You can contact us here

Accelerating Research