Epitaxial growth of B a T i O3 thin films at 600 °C by metalorganic chemical vapor deposition | Zendy

Debra L. Kaiser | Zendy; Mark D. Vaudin | Zendy; L. D. Rotter | Zendy; Zhong Lin Wang | Zendy; James P. Cline | Zendy; Cheol Seong Hwang | Zendy; Ryna B. Marinenko | Zendy; John G. Gillen | Zendy

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Epitaxial growth of B a T i O3 thin films at 600 °C by metalorganic chemical vapor deposition

Author(s) -

Debra L. Kaiser,

Mark D. Vaudin,

L. D. Rotter,

Zhong Lin Wang,

James P. Cline,

Cheol Seong Hwang,

Ryna B. Marinenko,

John G. Gillen

Publication year - 1995

Publication title -

applied physics letters

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.182

H-Index - 442

eISSN - 1077-3118

pISSN - 0003-6951

DOI - 10.1063/1.113480

Subject(s) - metalorganic vapour phase epitaxy , epitaxy , chemical vapor deposition , substrate (aquarium) , thin film , materials science , combustion chemical vapor deposition , analytical chemistry (journal) , group 2 organometallic chemistry , deposition (geology) , crystallography , chemistry , optoelectronics , carbon film , nanotechnology , layer (electronics) , organic chemistry , oceanography , molecule , geology , paleontology , sediment , biology

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