Open AccessMaskless writing of submicrometer gratings in fused silica by focused ion beam implantation and differential wet etching
Author(s) -
Jacques Albert,
K. O. Hill,
B. Malo,
D. C. Johnson,
F. Bilodeau,
I. M. Templeton,
J. L. Brebner
Publication year - 1993
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.110509
Subject(s) - materials science , photolithography , etching (microfabrication) , hydrofluoric acid , groove (engineering) , grating , optics , ion implantation , optoelectronics , ion beam , masking (illustration) , isotropic etching , diffraction grating , ion , beam (structure) , nanotechnology , layer (electronics) , chemistry , physics , organic chemistry , art , metallurgy , visual arts
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