Open AccessEllipsometric study of Si0.5Ge0.5/Si strained-layer superlattices
Author(s) -
R. M. Sieg,
Samuel A. Alterovitz,
E. T. Croke,
M. J. Harrell
Publication year - 1993
Publication title -
applied physics letters
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.108607
Subject(s) - superlattice , ellipsometry , materials science , layer (electronics) , diffraction , oxide , x ray crystallography , optoelectronics , optics , thin film , nanotechnology , metallurgy , physics
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