Erratum: ‘‘GaAs-oxide removal using an electron cyclotron resonance hydrogen plasma’’ [Appl. Phys. Lett. 58, 1143 (1991)]
Author(s) -
Zhaoming Lu,
Michael Schmidt,
D. Chen,
Richard M. Osgood,
W. M. Holber,
D. V. Podlesnik,
John Forster
Publication year - 1992
Publication title -
applied physics letters
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.108499
Subject(s) - electron cyclotron resonance , plasma , electron , atomic physics , hydrogen , resonance (particle physics) , oxide , cyclotron resonance , materials science , cyclotron , physics , chemistry , nuclear physics , quantum mechanics , metallurgy
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