X-ray scattering studies of the SiO2/Si(001) interfacial structure | Zendy

T. A. Rabedeau | Zendy; I. M. Tidswell | Zendy; P. S. Pershan | Zendy; J. Bevk | Zendy; B. S. Freer | Zendy

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X-ray scattering studies of the SiO2/Si(001) interfacial structure

Author(s) -

T. A. Rabedeau,

I. M. Tidswell,

P. S. Pershan,

J. Bevk,

B. S. Freer

Publication year - 1991

Publication title -

applied physics letters

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.182

H-Index - 442

eISSN - 1077-3118

pISSN - 0003-6951

DOI - 10.1063/1.105371

Subject(s) - scattering , metastability , annealing (glass) , materials science , epitaxy , crystallography , dimer , x ray , silicon , chemical physics , condensed matter physics , chemistry , optics , nanotechnology , metallurgy , physics , layer (electronics) , organic chemistry

X‐ray scattering has been utilized in a study of the SiO2/Si(001) interfacial structure. Scattering data provide evidence for a low coverage 2×1 epitaxial structure at the SiO2/Si interface for dry oxides grown on highly ordered Si surfaces at room temperature. The observed scattering is consistent with distorted dimer models of the interfacial structure. Thermal annealing substantially reduces the order of the 2×1 structure while prolonged exposure to humid air almost eliminates the 2×1 symmetry scattering. These findings suggest that the observed 2×1 order is associated with a metastable, intermediate state of the dry oxidation process.

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