Open AccessErratum: Thickness effect of amorphous Si film on formation of 7×7 superlattice surface during its solid phase epitaxial growth [Appl. Phys. Lett. 5 5, 2078 (1989)]
Author(s) -
Yukichi Shigeta,
Kunisuke Maki
Publication year - 1990
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.103339
Subject(s) - superlattice , epitaxy , amorphous solid , materials science , condensed matter physics , phase (matter) , surface (topology) , optoelectronics , crystallography , nanotechnology , chemistry , physics , quantum mechanics , geometry , mathematics , layer (electronics)
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