Open AccessQuantum device microfabrication: Resolution limits of ion beam patterning
Author(s) -
Axel Scherer,
M. L. Roukes
Publication year - 1989
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.101876
Subject(s) - microfabrication , materials science , heterojunction , optoelectronics , etching (microfabrication) , ion beam , resolution (logic) , focused ion beam , semiconductor device , ion , semiconductor , gallium arsenide , beam (structure) , nanotechnology , optics , chemistry , fabrication , physics , computer science , medicine , alternative medicine , organic chemistry , pathology , layer (electronics) , artificial intelligence
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