Open AccessIndium oxide diffusion barriers for Al/Si metallizations
Author(s) -
E. Kolawa,
C. M. Garland,
L.T. Tran,
C. W. Nieh,
J. M. Molarius,
W. Flick,
M−A. Nicolet,
Jun Wei
Publication year - 1988
Publication title -
applied physics letters
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.100541
Subject(s) - materials science , indium , diffusion barrier , eutectic system , silicon , sputtering , transmission electron microscopy , oxide , diffusion , titanium , silicide , layer (electronics) , analytical chemistry (journal) , thin film , optoelectronics , metallurgy , composite material , nanotechnology , alloy , chemistry , thermodynamics , physics , chromatography
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