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Two-layer radio frequency MEMS fractal capacitors in PolyMUMPS for S-band applications
Author(s) -
Amro M. Elshurafa,
K. Saláma
Publication year - 2012
Publication title -
micro and nano letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.25
H-Index - 31
ISSN - 1750-0443
DOI - 10.1049/mnl.2012.0181
Subject(s) - capacitor , microelectromechanical systems , capacitance , materials science , surface micromachining , film capacitor , fractal , filter capacitor , optoelectronics , q factor , electrical engineering , engineering , physics , voltage , fabrication , resonator , medicine , mathematical analysis , alternative medicine , mathematics , electrode , pathology , quantum mechanics
In this Letter, the authors fabricate for the first time MEMS fractal capacitors possessing two layers and compare their performance characteristics with the conventional parallel-plate capacitor and previously reported state-of-the-art single-layer MEMS fractal capacitors. Explicitly, a capacitor with a woven structure and another with an interleaved configuration were fabricated in the standard PolyMUMPS surface micromachining process and tested at S-band frequencies. The self-resonant frequencies of the fabricated capacitors were close to 10GHz, which is better than that of the parallel-plate capacitor, which measured only 5.5GHz. Further, the presented capacitors provided a higher capacitance when compared with the state-of-the-art-reported MEMS fractal capacitors created using a single layer at the expense of a lower quality factor. © 2012 The Institution of Engineering and Technology

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