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Low temperaturein situformation of cobalt in silicon nitride toward functional nitride nanocomposites
Author(s) -
Shotaro Tada,
Maíra Debarba Mallmann,
Haruna Takagi,
Junya Iihama,
Norifumi Asakuma,
Toru Asaka,
Yusuke Daiko,
Sawao Honda,
Rafael Kenji Nishihora,
Ricardo Antônio Francisco Machado,
Samuel Bernard,
Yuji Iwamoto
Publication year - 2021
Publication title -
chemical communications
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.837
H-Index - 333
eISSN - 1364-548X
pISSN - 1359-7345
DOI - 10.1039/d0cc07366k
Subject(s) - nitride , in situ , nanocomposite , silicon nitride , materials science , cobalt , metal , pyrolysis , chemical engineering , silicon , nanotechnology , chemistry , metallurgy , layer (electronics) , organic chemistry , engineering
This work highlights the first demonstration of a low-temperature in situ formation of Co nanocrystallites embedded within an amorphous silicon nitride matrix through careful control of the chemistry behind material design using perhydropolysilazane (PHPS) as a Si3N4 precursor further coordinated with CoCl2 and ammonia as a pyrolysis atmosphere. The Co nucleation was allowed to proceed at temperatures as low as 400 °C via thermal decomposition of Co2N pre-formed in situ by the reaction of CoCl2 with the Si centers of PHPS at the early stage of pyrolysis (220-350 °C).

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