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Surface passivation of boron emitters on n-type c-Si solar cells using silicon dioxide and a PECVD silicon oxynitride stack
Author(s) -
Nagarajan Balaji,
Seung-Hwan Lee,
Cheolmin Park,
Jayapal Raja,
Huong Thi Thanh Nguyen,
Somenath Chatterjee,
K. Nikesh,
R. Jeyakumar,
Junsin Yi
Publication year - 2016
Publication title -
rsc advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.746
H-Index - 148
ISSN - 2046-2069
DOI - 10.1039/c6ra11043f
Subject(s) - passivation , silicon oxynitride , materials science , plasma enhanced chemical vapor deposition , silicon dioxide , silicon , stack (abstract data type) , boron , optoelectronics , layer (electronics) , nanotechnology , chemistry , composite material , computer science , silicon nitride , organic chemistry , programming language

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