Patterned polymer brushes | Zendy

Tao Chen | Zendy; Ihsan Amin | Zendy; Rainer Jordan | Zendy

AI Assistant Blog Pricing

Home ZAIA Blog

Open Access

Patterned polymer brushes

Author(s) -

Tao Chen,

Ihsan Amin,

Rainer Jordan

Publication year - 2012

Publication title -

chemical society reviews

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 15.598

H-Index - 513

eISSN - 1460-4744

pISSN - 0306-0012

DOI - 10.1039/c2cs15225h

Subject(s) - lithography , nanotechnology , materials science , next generation lithography , photolithography , electron beam lithography , polymer , x ray lithography , maskless lithography , soft lithography , resist , stencil lithography , interference lithography , fabrication , optoelectronics , composite material , layer (electronics) , medicine , alternative medicine , pathology

This critical review summarizes recent developments in the fabrication of patterned polymer brushes. As top-down lithography reaches the length scale of a single macromolecule, the combination with the bottom-up synthesis of polymer brushes by surface-initiated polymerization becomes one main avenue to design new materials for nanotechnology. Recent developments in surface-initiated polymerizations are highlighted along with diverse strategies to create patterned polymer brushes on all length scales based on irradiation (photo- and interference lithography, electron-beam lithography), mechanical contact (scanning probe lithography, soft lithography, nanoimprinting lithography) and on surface forces (capillary force lithography, colloidal lithography, Langmuir-Blodgett lithography) (116 references).

The content you want is available to Zendy users.

Already have an account? Click here to sign in.

Having issues? You can contact us here

Accelerating Research