Design of an in-house ambient pressure AP-XPS using a bench-top X-ray source and the surface chemistry of ceria under reaction conditions | Zendy

Franklin Tao | Zendy

Open Access

Design of an in-house ambient pressure AP-XPS using a bench-top X-ray source and the surface chemistry of ceria under reaction conditions

Author(s) -

Franklin Tao

Publication year - 2012

Publication title -

chemical communications

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.837

H-Index - 333

eISSN - 1364-548X

pISSN - 1359-7345

DOI - 10.1039/c2cc17715c

Subject(s) - x ray photoelectron spectroscopy , catalysis , ambient pressure , torr , oxygen , chemistry , chemical engineering , materials science , analytical chemistry (journal) , organic chemistry , thermodynamics , physics , engineering

A new in-house ambient pressure XPS (AP-XPS) was designed for the study of surfaces of materials under reaction conditions and during catalysis. Unique features of this in-house AP-XPS are the use of monochromated Al Kα and integration of a minimized reaction cell, and working conditions of up to 500 °C in gases of tens of Torr. Generation of oxygen vacancies on ceria and filling them with oxygen atoms were characterized in operando.

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