Complex three-dimensional conformal surfaces formed by atomic layer deposition: computation and experimental verification | Zendy

Andrew Brzezinski | Zendy; YingChieh Chen | Zendy; Pierre Wiltzius | Zendy; Paul V. Braun | Zendy

Open Access

Complex three-dimensional conformal surfaces formed by atomic layer deposition: computation and experimental verification

Author(s) -

Andrew Brzezinski,

YingChieh Chen,

Pierre Wiltzius,

Paul V. Braun

Publication year - 2009

Publication title -

journal of materials chemistry

Language(s) - English

Resource type - Journals

eISSN - 1364-5501

pISSN - 0959-9428

DOI - 10.1039/b914318a

Subject(s) - dielectric , conformal map , atomic layer deposition , materials science , deposition (geology) , porosity , computation , layer (electronics) , porous medium , photonic crystal , distribution (mathematics) , mineralogy , composite material , geometry , optoelectronics , computer science , algorithm , chemistry , geology , mathematics , mathematical analysis , paleontology , sediment

Atomic layer deposition in complex three-dimensional porous materials is useful for manipulating properties such as pore size, pore connectivity, density, and dielectric constant. In order to calculate a material's properties it is necessary to determine the material distribution. A generally applicable algorithm for determining the material distribution and pore connectivity is presented. Calculations using the algorithm compared favorably with experimental results for the important case of infilling dielectric material into three-dimensional photonic crystal templates.

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