Chemical force microscopy for hot-embossing lithography release layer characterization | Zendy

Neil S. Cameron | Zendy; Arnaud Ott | Zendy; Hélène Roberge | Zendy; Teodor Veres | Zendy

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Chemical force microscopy for hot-embossing lithography release layer characterization

Author(s) -

Neil S. Cameron,

Arnaud Ott,

Hélène Roberge,

Teodor Veres

Publication year - 2006

Publication title -

soft matter

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.99

H-Index - 170

eISSN - 1744-6848

pISSN - 1744-683X

DOI - 10.1039/b600936k

Subject(s) - embossing , monolayer , lithography , polymer , characterization (materials science) , materials science , microscopy , glass transition , layer (electronics) , atomic force microscopy , chemical engineering , nanotechnology , composite material , polymer chemistry , optoelectronics , optics , physics , engineering

We employed variable temperature chemical force microscopy (VT-CFM) using tips silanized with four different hydro- and hydrofluoroalkyl self-assembling monolayers (SAMs) interacting with a thin-film of poly(cyclic olefin), (PCO) to model the hot-embossing stamp-polymer interaction over a temperature range spanning the glass transition of the PCO.

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