Open AccessReaction of Methylcyclopentadienyl Manganese Tricarbonyl on Silicon Oxide Surfaces: Implications for Thin Film Atomic Layer Depositions
Author(s) -
Menno Bouman,
Xiangdong Qin,
Vananh Doan,
Benjamin Groven,
Francisco Zaera
Publication year - 2014
Publication title -
organometallics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.231
H-Index - 172
eISSN - 1520-6041
pISSN - 0276-7333
DOI - 10.1021/om5006269
Subject(s) - chemistry , x ray photoelectron spectroscopy , fulvene , silanol , infrared spectroscopy , thermal desorption spectroscopy , thermal decomposition , ligand (biochemistry) , inorganic chemistry , oxide , desorption , silicon oxide , silicon , atomic layer deposition , manganese , photochemistry , adsorption , layer (electronics) , catalysis , organic chemistry , chemical engineering , biochemistry , receptor , engineering , silicon nitride
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