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Experimental Realization of a Polarization-Independent Ultraviolet/Visible Coaxial Plasmonic Metamaterial
Author(s) -
Marie Anne van de Haar,
Ruben Maas,
H. Schokker,
Albert Polman
Publication year - 2014
Publication title -
nano letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 4.853
H-Index - 488
eISSN - 1530-6992
pISSN - 1530-6984
DOI - 10.1021/nl5028183
Subject(s) - materials science , plasmon , metamaterial , reactive ion etching , optics , optoelectronics , electron beam lithography , polarization (electrochemistry) , etching (microfabrication) , physics , nanotechnology , chemistry , resist , layer (electronics)
We report the experimental realization of an optical metamaterial composed of a hexagonal array of coaxial plasmonic metal/insulator/metal waveguides that shows strong polarization-independent optical mode index dispersion in the ultraviolet/blue. The metamaterial is composed of silicon coaxes with a well-defined diameter in the range of 150-168 nm with extremely thin sidewalls (13-15 nm), embedded in a silver film, fabricated using a combination of electron beam lithography, physical vapor deposition, reactive ion etching, and focused ion beam polishing. Using a Mach-Zehnder interferometer the phase advance is measured on several metamaterial samples with different dimensions in the UV/visible part of the spectrum. For all geometries the spectral features as well as the geometry dependence of the data correspond well with numerical finite-difference time domain simulations and the calculated waveguide dispersion diagram, showing a negative mode index between 440 and 500 nm.

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