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Growth of Y-Shaped Nanorods through Physical Vapor Deposition
Author(s) -
Jian Wang,
Hanchen Huang,
S. V. Kesapragada,
Daniel Gall
Publication year - 2005
Publication title -
nano letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 4.853
H-Index - 488
eISSN - 1530-6992
pISSN - 1530-6984
DOI - 10.1021/nl0518425
Subject(s) - nanorod , sputter deposition , materials science , stacking , deposition (geology) , physical vapor deposition , branching (polymer chemistry) , molecular dynamics , nanotechnology , chemical physics , chemical vapor deposition , kinetics , diffusion , mechanism (biology) , vapour deposition , chemical engineering , sputtering , thin film , chemistry , physics , computational chemistry , composite material , thermodynamics , paleontology , organic chemistry , quantum mechanics , sediment , engineering , biology
This work presents a proposed mechanism for fabricating Y-shaped nanorods, demonstrates the feasibility of the proposal through classical molecular dynamics simulations, and validates the simulations through magnetron sputter deposition experiments. The proposed mechanism relies primarily on the formation of stacking faults during deposition and to a lesser degree on diffusion kinetics and geometrical shadowing. Applications of the proposed mechanism may enable the design of nanorod arrays with controlled branching.

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