Atomic Layer Deposition to Fine-Tune the Surface Properties and Diameters of Fabricated Nanopores
Author(s) -
Peng Chen,
Toshiyuki Mitsui,
Damon B. Farmer,
J. A. Golovchenko,
Roy G. Gordon,
Daniel Branton
Publication year - 2004
Publication title -
nano letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 4.853
H-Index - 488
eISSN - 1530-6992
pISSN - 1530-6984
DOI - 10.1021/nl0494001
Subject(s) - nanopore , atomic layer deposition , deposition (geology) , materials science , layer (electronics) , nanotechnology , polyelectrolyte , surface charge , molecule , yield (engineering) , chemical engineering , analytical chemistry (journal) , chemistry , polymer , composite material , organic chemistry , paleontology , sediment , engineering , biology
Atomic layer deposition of alumina enhanced the molecule sensing characteristics of fabricated nanopores by fine-tuning their surface properties, reducing 1/f noise, neutralizing surface charge to favor capture of DNA and other negative polyelectrolytes, and controlling the diameter and aspect ratio of the pores with near single Ångstrom precision. The control over the chemical and physical nature of the pore surface provided by atomic layer deposition produced a higher yield of functional nanopore detectors.
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