Open AccessPorphyrin-Based Photocatalytic Lithography
Author(s) -
Jane P. Bearinger,
G. Stone,
Allen T. Christian,
Lawrence Dugan,
Amy L. Hiddessen,
Kuang Jeri J. Wu,
Ligang Wu,
Julie Hamilton,
Cheryl Stockton,
Jeffrey A. Hubbell
Publication year - 2008
Publication title -
langmuir
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.042
H-Index - 333
eISSN - 1520-5827
pISSN - 0743-7463
DOI - 10.1021/la703992r
Subject(s) - lithography , photocatalysis , porphyrin , nanotechnology , photolithography , materials science , stencil lithography , chemistry , optoelectronics , photochemistry , resist , x ray lithography , catalysis , organic chemistry , layer (electronics)
Photocatalytic lithography couples light with photoreactive coated mask materials to pattern surface chemistry. We excite porphyrins to create radical species that photocatalytically oxidize, and thereby pattern, chemistries in the local vicinity. The technique advantageously is suited for use with a wide variety of substrates. It is fast and robust, and the wavelength of light does not limit the resolution of patterned features. We have patterned proteins and cells to demonstrate the utility of photocatalytic lithography in life science applications.