Photochemical Lithography: Creation of Patterned, Acid Chloride Functionalized Surfaces Using UV Light and Gas-Phase Oxalyl Chloride
Author(s) -
Ghaleb A. Husseini,
T.L. Niederhauser,
Justin G. Peacock,
M. R. Ver,
YitYian Lua,
Matthew C. Asplund,
Eric T. Sevy,
Matthew R. Linford
Publication year - 2003
Publication title -
langmuir
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.042
H-Index - 333
eISSN - 1520-5827
pISSN - 0743-7463
DOI - 10.1021/la020896g
Subject(s) - altmetrics , citation , lithography , analytical chemistry (journal) , computer science , nanotechnology , world wide web , chemistry , library science , materials science , physics , optics , organic chemistry
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