Atomic Force Microscope Based Kelvin Probe Measurements: Application to an Electrochemical Reaction | Zendy

M. Böhmisch | Zendy; Frank Burmeister | Zendy; A. Rettenberger | Zendy; Jörg Zimmermann | Zendy; Johannes Boneberg | Zendy; P. Leiderer | Zendy

AI Assistant Blog Pricing

Home ZAIA Blog

Open Access

Atomic Force Microscope Based Kelvin Probe Measurements: Application to an Electrochemical Reaction

Author(s) -

M. Böhmisch,

Frank Burmeister,

A. Rettenberger,

Jörg Zimmermann,

Johannes Boneberg,

P. Leiderer

Publication year - 1997

Publication title -

the journal of physical chemistry b

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.864

H-Index - 392

eISSN - 1520-6106

pISSN - 1520-5207

DOI - 10.1021/jp9728767

Subject(s) - kelvin probe force microscope , materials science , atomic force microscopy , work (physics) , nanostructure , semiconductor , microscope , conductive atomic force microscopy , volta potential , work function , etching (microfabrication) , electrochemistry , nanotechnology , analytical chemistry (journal) , optoelectronics , chemistry , electrode , optics , physics , thermodynamics , layer (electronics) , chromatography

An atomic force microscope (AFM) was utilized as a Kelvin probe to determine work functions of several metals and semiconductors quantitatively. Most of the experimental data show excellent agreement with published values measured by photoemission. Variations in work functions as low as 5 mV could be detected with a typical lateral resolution of 20 nm. This method allowed us to analyze and explain the energetics of an electrochemical reaction on the surface of WSe2, which could be in situ induced and controlled by an externally applied voltage between AFM tip and sample. Thus it could be exploited for etching nanostructures.

The content you want is available to Zendy users.

Already have an account? Click here to sign in.

Having issues? You can contact us here

Accelerating Research