Open AccessDirect Measurement of van der Waals and Diffuse Double-Layer Forces between Titanium Dioxide Surfaces Produced by Atomic Layer Deposition
Author(s) -
Rick B. Walsh,
Andrew Nelson,
William Skinner,
Drew F. Parsons,
Vincent S. J. Craig
Publication year - 2012
Publication title -
the journal of physical chemistry c
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.401
H-Index - 289
eISSN - 1932-7455
pISSN - 1932-7447
DOI - 10.1021/jp300533m
Subject(s) - van der waals force , chemistry , isoelectric point , intermolecular force , layer (electronics) , dlvo theory , titanium dioxide , van der waals radius , deposition (geology) , adhesion , double layer (biology) , van der waals strain , atomic layer deposition , chemical physics , van der waals surface , titanium , suspension (topology) , materials science , molecule , colloid , composite material , organic chemistry , paleontology , sediment , biology , enzyme , mathematics , homotopy , pure mathematics
The van der Waals forces between titanium dioxide surfaces produced by atomic layer deposition (ALD) at the isoelectric point have been measured and found to agree with the calculated interaction using Lifshitz theory. It is shown that under the right conditions very smooth ALD surfaces are produced. At pH values slightly below and above the isoelectric point, a repulsive diffuse double-layer repulsion was observed and is attributed to positive and negative charging of the surfaces, respectively. At high pH, it was found that the forces remained repulsive up until contact and no van der Waals attraction or adhesion was evident. The absence of an attraction cannot be explained by the presence of hydration forces.© 2012, American Chemical Societ
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