Position-Controlled Seedless Growth of ZnO Nanorod Arrays on a Polymer Substrate via Wet Chemical Synthesis
Author(s) -
Benjamin Weintraub,
Yulin Deng,
Zhong Lin Wang
Publication year - 2007
Publication title -
the journal of physical chemistry c
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.401
H-Index - 289
eISSN - 1932-7455
pISSN - 1932-7447
DOI - 10.1021/jp073806v
Subject(s) - nanorod , kapton , materials science , substrate (aquarium) , scanning electron microscope , layer (electronics) , nucleation , polyimide , nanotechnology , polymer , lithography , electron beam lithography , polymer substrate , optoelectronics , chemical engineering , resist , composite material , chemistry , organic chemistry , oceanography , geology , engineering
A novel wet chemical technique for the site-selective growth of ZnO nanorod arrays on polymer substrates is described. Electron beam lithography is employed to define nanorod positions using a polymethylmethacrylate (PMMA) mask on a Kapton polyimide substrate with a Au intermediate layer. An applied potential is utilized to enhance the nucleation process and achieve ZnO nanorods with a base diameter of 200 nm. The technique does not require a ZnO seed layer and can be carried out at temperatures as low as 70 °C. Structural characterization of the as-grown ZnO nanorods has been investigated by scanning electron microscopy and X-ray diffraction. This technique represents a new low-cost method for integrating ZnO nanorods into flexible electronic devices.
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