Creation of Cadmium Sulfide Nanostructures Using AFM Dip-Pen Nanolithography | Zendy

Lei Ding | Zendy; Yan Li | Zendy; Haibin Chu | Zendy; Xuemei Li | Zendy; Jie Liu | Zendy

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Creation of Cadmium Sulfide Nanostructures Using AFM Dip-Pen Nanolithography

Author(s) -

Lei Ding,

Yan Li,

Haibin Chu,

Xuemei Li,

Jie Liu

Publication year - 2005

Publication title -

the journal of physical chemistry b

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.864

H-Index - 392

eISSN - 1520-6106

pISSN - 1520-5207

DOI - 10.1021/jp053389r

Subject(s) - nanolithography , x ray photoelectron spectroscopy , dip pen nanolithography , materials science , nanotechnology , nanometre , substrate (aquarium) , nanostructure , deposition (geology) , chemical engineering , fabrication , composite material , medicine , paleontology , oceanography , alternative medicine , pathology , sediment , engineering , biology , geology

A dip-pen nanolithography (DPN) process capable of depositing nanoscaled structures of semiconducting CdS materials was developed by careful control of the reaction speed between the precursors. The new development expanded the scope of the powerful DPN process and provided more insight in the deposition mechanism. Features ranging from several hundreds of nanometers to sub-50 nanometers were generated and characterized. The effects of the surface property of the substrate, the relative humidity, the translating rate, and the temperature were systematically investigated. X-ray photoelectron spectroscopy (XPS) was used to verify the chemical composition of the patterns. In principle, this simple and convenient method should be applicable to deposit various metal sulfides on suitable substrates.

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