Cycloaddition Reactions of 1,3-Cyclohexadiene on the Silicon(001) Surface
Author(s) -
Cheol Ho Choi,
Mark S. Gordon
Publication year - 1999
Publication title -
journal of the american chemical society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 7.115
H-Index - 612
eISSN - 1520-5126
pISSN - 0002-7863
DOI - 10.1021/ja9914285
Subject(s) - cycloaddition , chemistry , isomerization , product distribution , silicon , transition state , dimer , potential energy surface , surface (topology) , reaction mechanism , photochemistry , chemical reaction , computational chemistry , chemical physics , molecule , catalysis , organic chemistry , geometry , mathematics
[2+2] and [4+2] cycloaddition reactions of 1,3-cyclohexadiene on the Si(001) surface were studied. It is shown that not only the [4+2] cycloaddition reaction but also the [2+2] cycloadditions can occur on the Si(001) surface. Surface isomerization reactions connecting [4+2] and [2+2] are very unlikely due to a high energy barrier, implying that the surface reactions are kinetically controlled. Therefore the final surface reaction products are determined during the initial stage of the reactions in contrast with earlier assumptions that the “product distribution is thermodynamically determined”. Our interpretations are consistent with the new experimental results by the Hamers group. According to our CASSCF(6,6) calculations, the nonsymmetric π-complex transition states along the [2+2] cycloaddition mechanism, which has been suggested by many theoretical studies, seem to be an artifact. Nevertheless, the very soft Si dimer buckling motion of the Si(001) surface certainly facilitates the [2+2] reaction.
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