Molecular Lithography through DNA-Mediated Etching and Masking of SiO2 | Zendy

Sumedh P. Surwade | Zendy; Shichao Zhao | Zendy; Haitao Liu | Zendy

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Molecular Lithography through DNA-Mediated Etching and Masking of SiO₂

Author(s) -

Sumedh P. Surwade,

Shichao Zhao,

Haitao Liu

Publication year - 2011

Publication title -

journal of the american chemical society

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 7.115

H-Index - 612

eISSN - 1520-5126

pISSN - 0002-7863

DOI - 10.1021/ja2038886

Subject(s) - chemistry , masking (illustration) , nanolithography , etching (microfabrication) , lithography , substrate (aquarium) , dna , nanotechnology , molecule , resist , optoelectronics , fabrication , medicine , art , biochemistry , physics , alternative medicine , oceanography , organic chemistry , materials science , pathology , layer (electronics) , visual arts , geology

We demonstrate a new approach to pattern transfer for bottom-up nanofabrication. We show that DNA promotes/inhibits the etching of SiO(2) at the single-molecule level, resulting in negative/positive tone pattern transfers from DNA to the SiO(2) substrate.

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