Organometallic Chemical Vapor Deposition of Palladium under Very Mild Conditions of Temperature in the Presence of a Low Reactive Gas Partial Pressure | Zendy

JeanCyrille Hierso | Zendy; Christine Satto | Zendy; Roselyne Feurer | Zendy; Philippe Kalck | Zendy

Open Access

Organometallic Chemical Vapor Deposition of Palladium under Very Mild Conditions of Temperature in the Presence of a Low Reactive Gas Partial Pressure

Author(s) -

JeanCyrille Hierso,

Christine Satto,

Roselyne Feurer,

Philippe Kalck

Publication year - 1996

Publication title -

chemistry of materials

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 3.741

H-Index - 375

eISSN - 1520-5002

pISSN - 0897-4756

DOI - 10.1021/cm960106m

Subject(s) - palladium , electron microprobe , chemistry , chemical vapor deposition , cyclopentadienyl complex , x ray photoelectron spectroscopy , deposition (geology) , scanning electron microscope , metal , ligand (biochemistry) , analytical chemistry (journal) , microprobe , thin film , group 2 organometallic chemistry , mass spectrometry , inorganic chemistry , materials science , chemical engineering , organic chemistry , catalysis , mineralogy , nanotechnology , molecule , paleontology , biochemistry , receptor , chromatography , sediment , engineering , composite material , biology

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