Nanoimprint Lithography of Al Nanovoids for Deep-UV SERS | Zendy

Tao Ding | Zendy; Daniel O. Sigle | Zendy; Lars O. Herrmann | Zendy; D. Wolverson | Zendy; Jeremy J. Baumberg | Zendy

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Nanoimprint Lithography of Al Nanovoids for Deep-UV SERS

Author(s) -

Tao Ding,

Daniel O. Sigle,

Lars O. Herrmann,

D. Wolverson,

Jeremy J. Baumberg

Publication year - 2014

Publication title -

acs applied materials and interfaces

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 2.535

H-Index - 228

eISSN - 1944-8252

pISSN - 1944-8244

DOI - 10.1021/am505511v

Subject(s) - materials science , nanoimprint lithography , raman scattering , ultraviolet , plasmon , electron beam lithography , nanotechnology , lithography , raman spectroscopy , biomolecule , optoelectronics , resist , optics , fabrication , layer (electronics) , medicine , physics , alternative medicine , pathology

Deep-ultraviolet surface-enhanced Raman scattering (UV-SERS) is a promising technique for bioimaging and detection because many biological molecules possess UV absorption lines leading to strongly resonant Raman scattering. Here, Al nanovoid substrates are developed by combining nanoimprint lithography of etched polymer/silica opal films with electron beam evaporation, to give a high-performance sensing platform for UV-SERS. Enhancement by more than 3 orders of magnitude in the UV-SERS performance was obtained from the DNA base adenine, matching well the UV plasmonic optical signatures and simulations, demonstrating its suitability for biodetection.

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