Photomask-Free, Direct Selective Electroless Deposition on Glass by Controlling Surface Hydrophilicity

This paper reports a new approach to realize direct selective electroless deposition (ELD) without the requirement of photolithography. This method involves sequential silane-compound modifications in which the first modification creates a hydrophobic surface on the TiO 2 -coated glass using a fluorine-rich alkoxysilane compound, followed by a laser ablation to create the pattern. Then, the entire substrate is immersed into an aqueous solution containing amino-silane equipped Pd nanoparticles for the second modification. Because most substrate surface is hydrophobic, the amino-silane-equipped Pd catalysts can only graft on the laser-ablated zone to accomplish selective ELD.