Open AccessCharacterization of Shock-Sensitive Deposits from the Hydrolysis of Hexachlorodisilane
Author(s) -
Yu-Jhen Lin,
Chien-Ho Liu,
Mo-Geng Chin,
Cheng-Chieh Wang,
Sheng-Hsun Wang,
HsiaoYun Tsai,
Jenq-Renn Chen,
Eugene Y. Ngai,
Ram S. Ramachandran
Publication year - 2019
Publication title -
acs omega
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.779
H-Index - 40
ISSN - 2470-1343
DOI - 10.1021/acsomega.8b03103
Subject(s) - silanol , hydrolysis , shock (circulatory) , chemistry , reactivity (psychology) , intramolecular force , materials science , inorganic chemistry , analytical chemistry (journal) , chemical engineering , organic chemistry , catalysis , medicine , alternative medicine , pathology , engineering
In this work, the shock sensitivity of hexachlorodisilane (HCDS) hydrolysis products was studied. The hydrolysis conditions included vapor and liquid HCDS hydrolysis in moist air. Shock sensitivity was determined by using a Fall hammer apparatus. Extensive infrared studies were done for the hydrolysis products. It was found that the Si-Si bond in HCDS during hydrolysis is preserved and can be cleaved by shock, leading to intramolecular oxidation of the neighboring silanol (Si-OH) groups to form a networked Si-O-Si structure and hydrogen gas. The limiting impact energy for shock sensitivity was also found proportional to the oxygen/silicon ratio in the deposit. Finally, recommendations are given for controlling the shock sensitivity of the hydrolyzed deposit.
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