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Engineering a Poly(3,4-ethylenedioxythiophene):(Polystyrene Sulfonate) Surface Using Self-Assembling Molecules—A Chemical Library Approach
Author(s) -
Paweł Dąbczyński,
Mateusz Marzec,
Łukasz Pięta,
Konrad Fijałkowski,
Joanna Raczkowska,
Andrzej Bernasik,
Andrzej Budkowski,
Jakub Rysz
Publication year - 2018
Publication title -
acs omega
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.779
H-Index - 40
ISSN - 2470-1343
DOI - 10.1021/acsomega.8b00029
Subject(s) - pedot:pss , materials science , polystyrene sulfonate , poly(3,4 ethylenedioxythiophene) , surface energy , polystyrene , work function , chemical engineering , surface modification , thiophene , conductive polymer , silane , sulfonate , polymer , layer (electronics) , polymer chemistry , organic solar cell , nanotechnology , composite material , organic chemistry , chemistry , sodium , engineering , metallurgy
The surface properties of poly(3,4-ethylenedioxythiophene):(polystyrene sulfonate) (PEDOT:PSS) affect the performance of many organic electronic devices. The work function determines the efficiency of the charge carrier transfer between PEDOT:PSS electrodes and the active layer of the device. The surface free energy affects phase separation in multicomponent blends that are typically used to fabricate active layers of organic light-emitting diodes and photovoltaic devices. Here, we present a method to prepare PEDOT:PSS films with a gradient work function and surface free energy. This modification was achieved by evaporation of trimethoxy(3,3,3-trifluoropropyl)silane in such a way that the degree of surface coverage of the molecules varied in the selected direction. Gradient films were used as electrodes to fabricate two-terminal PEDOT:PSS/poly(3-hexyl thiophene)/Au devices to rapidly screen for the influence of the modification on the performance of the prepared polymer diodes. Gradual changes in the morphology of the solution-cast model poly(3-butyl thiophene)/poly-bromostyrene films followed changes in the surface energy of the substrate.

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