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Boosting the Electrochemical Performance of Li1.2Mn0.54Ni0.13Co0.13O2 by Atomic Layer-Deposited CeO2 Coating
Author(s) -
Yan Gao,
Rajankumar L. Patel,
Kuan-Yu Shen,
Xiaofeng Wang,
Richard L. Axelbaum,
Xinhua Liang
Publication year - 2018
Publication title -
acs omega
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.779
H-Index - 40
ISSN - 2470-1343
DOI - 10.1021/acsomega.7b01922
Subject(s) - atomic layer deposition , materials science , analytical chemistry (journal) , electrochemistry , conductivity , dielectric spectroscopy , lithium (medication) , x ray photoelectron spectroscopy , electrode , transmission electron microscopy , thin film , dissolution , work function , layer (electronics) , chemical engineering , nanotechnology , chemistry , medicine , chromatography , endocrinology , engineering
It has been demonstrated that atomic layer deposition (ALD) provides an initially safeguarding, uniform ultrathin film of controllable thickness for lithium-ion battery electrodes. In this work, CeO 2 thin films were deposited to modify the surface of lithium-rich Li 1.2 Mn 0.54 Ni 0.13 Co 0.13 O 2 (LRNMC) particles via ALD. The film thicknesses were measured by transmission electron microscopy. For electrochemical performance, ∼2.5 nm CeO 2 film, deposited by 50 ALD cycles (50Ce), was found to have the optimal thickness. At a 1 C rate and 55 °C in a voltage range of 2.0-4.8 V, an initial capacity of 199 mAh/g was achieved, which was 8% higher than that of the uncoated (UC) LRNMC particles. Also, 60.2% of the initial capacity was retained after 400 cycles of charge-discharge, compared to 22% capacity retention of UC after only 180 cycles of charge-discharge. A robust kinetic of electrochemical reaction was found on the CeO 2 -coated samples at 55 °C through electrochemical impedance spectroscopy. The conductivity of 50Ce was observed to be around 3 times higher than that of UC at 60-140 °C. The function of the CeO 2 thin-film coating was interpreted as being to increase substrate conductivity and to block the dissolution of metal ions during the charge-discharge process.

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