Open AccessMolecular Glass Resists Based on Tetraphenylsilane Derivatives: Effect of Protecting Ratios on Advanced Lithography
Author(s) -
Yake Wang,
Jinping Chen,
Yi Zeng,
Tianjun Yu,
Xudong Guo,
Shuangqing Wang,
Timothée Allenet,
Michaela Vockenhuber,
Yasin Ekinci,
Jun Zhao,
Shumin Yang,
Yanqing Wu,
Guoqiang Yang,
Yi Li
Publication year - 2022
Publication title -
acs omega
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.779
H-Index - 40
ISSN - 2470-1343
DOI - 10.1021/acsomega.2c03445
Subject(s) - resist , extreme ultraviolet lithography , materials science , lithography , electron beam lithography , nanotechnology , x ray lithography , optoelectronics , layer (electronics)
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