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Low-Temperature (<40 °C) Atmospheric-Pressure Dielectric-Barrier-Discharge-Jet Treatment on Nickel Oxide for p–i–n Structure Perovskite Solar Cells
Author(s) -
Jui-Hsuan Tsai,
IChun Cheng,
ChengChe Hsu,
JianZhang Chen
Publication year - 2020
Publication title -
acs omega
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.779
H-Index - 40
ISSN - 2470-1343
DOI - 10.1021/acsomega.0c00067
Subject(s) - non blocking i/o , materials science , nickel oxide , dielectric barrier discharge , perovskite (structure) , oxide , dielectric , grain boundary , wetting , analytical chemistry (journal) , optoelectronics , composite material , chemical engineering , chemistry , metallurgy , microstructure , biochemistry , chromatography , engineering , catalysis

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