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Postdeposition UV-Ozone Treatment: An Enabling Technique to Enhance the Direct Adhesion of Gold Thin Films to Oxidized Silicon
Author(s) -
Hai Le The,
Roald M. Tiggelaar,
Erwin Berenschot,
Albert van den Berg,
Niels R. Tas,
Jan C. T. Eijkel
Publication year - 2019
Publication title -
acs nano
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 5.554
H-Index - 382
eISSN - 1936-086X
pISSN - 1936-0851
DOI - 10.1021/acsnano.9b01403
Subject(s) - materials science , nanotechnology , monolayer , nanometre , silicon , ultraviolet , adhesion , layer (electronics) , nanostructure , oxide , silicon oxide , ozone , optoelectronics , chemical engineering , composite material , chemistry , silicon nitride , metallurgy , engineering , organic chemistry
We found that continuous films of gold (Au) on oxidized silicon (SiO) substrates, upon treatment with ultraviolet (UV)-ozone, exhibit strong adhesion to the SiO support. Importantly, the enhancement is independent of micro- or nanostructuring of such nanometer-thick films. Deposition of a second Au layer on top of the pretreated Au layer makes the adhesion stable for at least 5 months in environmental air. Using this treatment method enables us to large-scale fabricate various SiO-supported Au structures at various thicknesses with dimensions spanning from a few hundreds of nanometers to a few micrometers, without the use of additional adhesion layers. We explain the observed adhesion improvement as polarization-induced increased strength of AuSi bonds at the Au-SiO interface due to the formation of a gold oxide monolayer on the Au surface by the UV-ozone treatment. Our simple and enabling method thus provides opportunities for patterning Au micro/nanostructures on SiO substrates without an intermediate metallic adhesion layer, which is critical for biosensing and nanophotonic applications.

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