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We demonstrate a versatile, catalyst free chemical vapor deposition process on insulating substrates capable of producing in one single stream one-dimensional (1D) WO 3- x suboxides leading to a wide range of substrate-supported 2H-WS 2 polymorphs: a tunable class of out-of-plane (of the substrate) nanophases, with 1D nanotubes and a pure WS 2 , two-dimensional (2D) nanomesh (defined as a network of webbed, micron-size, few-layer 2D sheets) at its extremes; and in-plane (parallel to the substrate) mono- and few-layer 2D domains. This entails a two-stage approach in which the 2WO 3 + 7S → 2WS 2 + 3SO 2 reaction is intentionally decoupled. First, various morphologies of nanowires or nanorods of high stoichiometry, WO 2.92 /WO 2.9 suboxides (belonging to the class of Magnéli phases) were formed, followed by their sulfurization to undergo reduction to the aforementioned WS 2 polymorphs. The continuous transition of WS 2 from nanotubes to the out-of-plane 2D nanomesh, via intermediary, mixed 1D-2D phases, delivers tunable functional properties, for example, linear and nonlinear optical properties, such as reflectivity (linked to optical excitations in the material), and second harmonic generation (SHG) and onset of saturable absorption. The SHG effect is very strong across the entire tunable class of WS 2 nanomaterials, weakest in nanotubes, and strongest in the 2D nanomesh. Furthermore, a mechanism via suboxide (WO 3- x ) intermediate as a possible path to 2D domain growth is demonstrated. 2D, in-plane WS 2 domains grow via "self-seeding and feeding" where short WO 2.92 /WO 2.9 nanorods provide both the nucleation sites and the precursor feedstock. Understanding the reaction path (here, in the W-O-S space) is an emerging approach toward controlling the nucleation, growth, and morphology of 2D domains and films of transition-metal dichalcogenides.

WS2Nanotubes, 2D Nanomeshes, and 2D In-Plane Films through One Single Chemical Vapor Deposition Route

WS₂Nanotubes, 2D Nanomeshes, and 2D In-Plane Films through One Single Chemical Vapor Deposition Route