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Superhydrophobic Polymer Composite Surfaces Developed via Photopolymerization
Author(s) -
Shreyas Pathreeker,
Paul Chando,
Fu-Hao Chen,
Saeid Biria,
Hansheng Li,
Eric B. Finkelstein,
Ian D. Hosein
Publication year - 2021
Publication title -
acs applied polymer materials
Language(s) - English
Resource type - Journals
ISSN - 2637-6105
DOI - 10.1021/acsapm.1c00744
Subject(s) - photopolymer , materials science , photomask , fabrication , nanotechnology , polymer , nanoparticle , composite number , porosity , micrometer , contact angle , surface roughness , composite material , optics , polymerization , resist , medicine , alternative medicine , physics , layer (electronics) , pathology
Fabrication of superhydrophobic materials using incumbent techniques involves several processing steps and is therefore either quite complex, not scalable, or often both. Here, the development of superhydrophobic surface-patterned polymer-TiO 2 composite materials using a simple, single-step photopolymerization-based approach is reported. The synergistic combination of concurrent, periodic bump-like pattern formation created using irradiation through a photomask and photopolymerization-induced nanoparticle (NP) phase separation enables the development of surface textures with dual-scale roughness (micrometer-sized bumps and NPs) that demonstrate high water contact angles, low roll-off angles, and desirable postprocessability such as flexibility, peel-and-stick capability, and self-cleaning capability. The effect of nanoparticle concentration on surface porosity and consequently nonwetting properties is discussed. Large-area fabrication over an area of 20 cm 2 , which is important for practical applications, is also demonstrated. This work demonstrates the capability of polymerizable systems to aid in the organization of functional polymer-nanoparticle surface structures.

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