Open AccessExtreme Ultraviolet-Printability and Mechanistic Studies of Engineered Hydrogen Silsesquioxane Photoresist Systems
Author(s) -
Ashish Rathore,
Ivan Pollentier,
Maicol Cipriani,
Harpreet Singh,
Danilo De Simone,
Oddur Ingólfsson,
Stefan De Gendt
Publication year - 2021
Publication title -
acs applied polymer materials
Language(s) - English
Resource type - Journals
ISSN - 2637-6105
DOI - 10.1021/acsapm.1c00018
Subject(s) - extreme ultraviolet lithography , hydrogen silsesquioxane , photoresist , resist , extreme ultraviolet , materials science , tetramethylammonium hydroxide , electron beam lithography , interference lithography , optoelectronics , chemistry , nanotechnology , optics , laser , fabrication , physics , layer (electronics) , medicine , alternative medicine , pathology
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