Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting | Zendy

M. Müller | Zendy; Kristina Komander | Zendy; Christian Höhn | Zendy; Roel van de Krol | Zendy; Aafke C. Bronneberg | Zendy

Open Access

Growth of Bi₂O₃ Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting

Author(s) -

M. Müller,

Kristina Komander,

Christian Höhn,

Roel van de Krol,

Aafke C. Bronneberg

Publication year - 2019

Publication title -

acs applied nano materials

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.227

H-Index - 29

ISSN - 2574-0970

DOI - 10.1021/acsanm.9b01261

Subject(s) - ellipsometry , atomic layer deposition , bismuth , amorphous solid , layer (electronics) , materials science , analytical chemistry (journal) , plasma , monolayer , deposition (geology) , refractive index , reactivity (psychology) , thin film , chemistry , nanotechnology , crystallography , optoelectronics , organic chemistry , medicine , paleontology , physics , alternative medicine , quantum mechanics , pathology , sediment , metallurgy , biology

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